期刊
PHYSICAL REVIEW B
卷 78, 期 6, 页码 -出版社
AMER PHYSICAL SOC
DOI: 10.1103/PhysRevB.78.064413
关键词
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资金
- National Science Foundation [DMR-0405259]
- U.S. Department of Energy [DE-AC03-76SF00098]
- National Natural Science Foundation of China [2006CB921303]
- Shanghai Education Development Foundation
- Fok Ying Tong education foundation
Antiferromagnetic (AFM) NiO thin films are grown epitaxially on vicinal Ag(118) substrate and investigated by x-ray linear dichroism (XLD). We find that the NiO AFM spins exhibit an in-plane spin-reorientation transition from parallel to perpendicular to the step edge direction with increasing the NiO film thickness. In addition to the conventional L-2 absorption edge, XLD effect at the Ni L-3 absorption edge is also measured and analyzed. The results identify a small energy shift of the L-3 peak. Temperature-dependent measurement confirms that the observed XLD effect in this system at the normal incidence of the x rays originates entirely from the NiO magnetic ordering.
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