期刊
PHYSICA STATUS SOLIDI-RAPID RESEARCH LETTERS
卷 3, 期 7-8, 页码 236-238出版社
WILEY-V C H VERLAG GMBH
DOI: 10.1002/pssr.200903228
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资金
- Deutsche Forschungsgemeinschaft [Wu 243/9]
A new ion beam assisted sputter deposition technique has been developed which facilitates room temperature fabrication of thin ZnO films with exceptional structural order. The well-defined texture of these films is comparable to films deposited at elevated temperatures of typically 200-300 degrees C in standard sputter processes. Structural investigations reveal that the applied Xe+ ion bombardment mainly affects the nucleation of ZnO crystallites. The high structural order of the nucleation layer is maintained in subsequent stages of film growth. (C) 2009 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
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