4.4 Article

Determination of the mean and the homogeneous barrier height of Cu Schottky contacts on heteroepitaxial beta-Ga2O3 thin films grown by pulsed laser deposition

出版社

WILEY-V C H VERLAG GMBH
DOI: 10.1002/pssa.201330088

关键词

gallium oxide; heteroepitaxy; pulsed laser deposition; Schottky barriers; thin films

资金

  1. EFRE [SAB 100132251]
  2. Universitat Leipzig

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We have investigated the electrical properties of Cu Schottky contacts (SCs) on (201)-oriented -Ga2O3 thin films, which have been grown by pulsed laser deposition (PLD). The I-V characteristics of two different sample structures exhibit rectification ratios at 2V up to 7 orders of magnitude. The dominant current transport mechanism is thermionic emission. By fitting the I-V characteristics, we obtained the ideality factor n and the effective barrier height phi Beff at temperatures between 50 and 320K. Considering a Gaussian barrier height distribution, we determined a mean barrier height of 1.32eV. The contacts are stable at high temperatures up to at least 550K. At this temperature a homogeneous barrier height of 1.32eV is found, consistent with the determined mean barrier height. The ideality factor for this temperature is 1.03 and barrier inhomogeneities do not influence current transport, making the contact close to ideal. Schematic band diagram of a Cu/beta-Ga2O3 Schottky contact at a temperature of 550 K. The inset shows a photographic image of the sample.(C) 2013 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim

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