期刊
PHYSICA E-LOW-DIMENSIONAL SYSTEMS & NANOSTRUCTURES
卷 43, 期 4, 页码 966-970出版社
ELSEVIER
DOI: 10.1016/j.physe.2010.11.026
关键词
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We study the tunneling magneto-transport properties of the Ferromagnetic Insulator-Normal Insulator-Ferromagnetic Insulator (F vertical bar N vertical bar F) and Ferromagnetic Insulator-Barrier Insulator-Ferromagnetic Insulator (F vertical bar B vertical bar F) junctions on the surface of topological insulator in which in-plane magnetization directions of both ferromagnetic sides can be parallel and antiparallel. We derive analytical expressions for electronic conductances of the two mentioned junctions with both parallel and antiparallel directions of magnetization and using them calculate the magnetoresistance of the two junctions. We use thin barrier approximation for investigating the F vertical bar B vertical bar F junction. We find that although magnetoresistance of the F vertical bar N vertical bar F and F vertical bar B vertical bar F junctions are tunable by changing the strength of magnetization texture, they show different behaviors with variation of magnetization. In contrast to the magnetoresistance of F vertical bar N vertical bar F, magnetoresistance of F vertical bar B vertical bar F junctions shows very smooth enhance by increasing the strength of magnetization. We suggest an experimental set up to detect our predicted effects. (C) 2010 Elsevier B.V. All rights reserved.
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