High contrast 3D imaging of surfaces near the wavelength limit using tabletop EUV ptychography

Scanning electron microscopy and atomic force microscopy are well-established techniques for imaging surfaces with nanometer resolution. Here we demonstrate a complementary and powerful approach based on tabletop extreme-ultraviolet ptychography that enables quantitative full field imaging with higher contrast than other techniques, and with compositional and topographical information. Using a high numerical aperture reflection -mode microscope illuminated by a tabletop 30 nm high harmonic source, we retrieve high quality, high contrast, full field images with 40 nm by 80 nm lateral resolution (1.3A), with a total exposure time of less than 1 min. Filially, quantitative phase information enables surface profilometry with ultra high, 6 A axial resolution. In the future, this work will enable dynamic imaging of functioning nanosystems with unprecedented combined spatial (< 10 nm) and temporal (< 10 Is) resolution, in thick opaque samples, with elemental, chemical and magnetic sensitivity. (C) 2015 The Authors. Published by Elsevier B.V..