期刊
OPTICS LETTERS
卷 34, 期 3, 页码 271-273出版社
OPTICAL SOC AMER
DOI: 10.1364/OL.34.000271
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资金
- National Science Foundation (NSF) [EEC-0310717]
We report the demonstration of a reflection microscope that operates at 13.2 nm wavelength with a spatial resolution of 55 +/- 3 nm. The microscope uses illumination from a tabletop extreme ultraviolet laser to acquire aerial images of photolithography masks with a 20 s exposure time. The modulation transfer function of the optical system was characterized. (C) 2009 Optical Society of America
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