We demonstrate the application of nondiffracting Bessel beams for reproducible nanometric-scale feature patterning in glass. A femtosecond pulse zero-order Bessel beam with a central spot radius of 360 nm was used to write 500 nm radius nanocraters over a longitudinal positioning range exceeding 20 mu m, with a variation in radius of less than 10%. The use of Bessel beams significantly reduces constraints on critical sample positioning in the nanoscale writing regime, enabling the use of femtosecond pulses for fast inscription of nanometer-scale features over large sample areas. (C) 2009 Optical Society of America
作者
我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。
推荐
暂无数据