期刊
OPTICS LETTERS
卷 33, 期 3, 页码 258-260出版社
Optica Publishing Group
DOI: 10.1364/OL.33.000258
关键词
-
类别
An infrared (IR) polarizer with tungsten silicide (WSi) wire grid was fabricated by two-beam interference exposure and reactive ion etching. To enhance TM transmittance, silicon monoxide was deposited between the WSi wire grid (400 nm period) and a Si substrate. The transmittance was over 80% in the 4-5 mu m wavelength range. The ratio of TM and TE transmittances was over 100 (20 dB) in the 2.5-6 mu m wavelength range. The fabricated polarizer has higher durability and bettter compatibility with microfabrication processes compared with conventional IR polarizers. (C) 2008 Optical Society of America.
作者
我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。
推荐
暂无数据