期刊
OPTICS EXPRESS
卷 19, 期 20, 页码 18827-18832出版社
OPTICAL SOC AMER
DOI: 10.1364/OE.19.018827
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资金
- Defense Advanced Research Projects Agency (DARPA)
- National Science Foundation (NSF)
- NSF Center for Integrated Access Networks (CIAN)
- Cymer Corporation
- U.S. Army Research Office
- Direct For Computer & Info Scie & Enginr
- Division Of Computer and Network Systems [0923523] Funding Source: National Science Foundation
- Div Of Electrical, Commun & Cyber Sys
- Directorate For Engineering [0901429, 1063976] Funding Source: National Science Foundation
An etch-free fabrication technique for creating low loss silicon waveguides in the silicon-on-insulator material system is proposed and demonstrated. The approach consists of local oxidation of a silicon-on-insulator chip covered with a e-beam patterned hydrogen silsesquioxane mask. A single oxidation step converts hydrogen silsesquioxane to a glasslike compound and simultaneously defines the waveguides, bypassing the need for any wet or dry etching steps. The spectral response of ring resonators fabricated using this technique was used to characterize the waveguide losses. Intrinsic Q-factors as high as 1.57 x 10(6), corresponding to a waveguide loss of 0.35dB/cm, were measured. (C) 2011 Optical Society of America
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