Second harmonic generation from metallo-dielectric multilayered structures in the plasmonic regime

We present a theoretical study on second harmonic generation from metallo-dielectric multilayered structures in the plasmonic regime. In particular we analyze the behavior of structures made of Ag (silver) and MgF2 (magnesium-fluoride) due to the straightforward procedure to grow these materials with standard sputtering or thermal evaporation techniques. A systematic study is performed which analyzes four different kinds of elementary cells- namely (Ag/MgF2)(N), (MgF2/Ag)(N), (Ag/MgF2/Ag)(N) and (MgF2/Ag/MgF2)(N)-as function of the number of periods (N) and the thickness of the layers. We predict the conversion efficiency to be up to three orders of magnitude greater than the conversion efficiency found in the non-plasmonic regime and we point out the best geometries to achieve these conversion efficiencies. We also underline the role played by the short-range/long-range plasmons and leaky waves in the generation process. We perform a statistical study to demonstrate the robustness of the SH process in the plasmonic regime against the inevitable variations in the thickness of the layers. Finally, we show that a proper choice of the output medium can further improve the conversion efficiency reaching an enhancement of almost five orders of magnitude with respect to the non plasmonic regime. (C) 2010 Optical Society of America