期刊
OPTICS EXPRESS
卷 16, 期 19, 页码 14411-14420出版社
OPTICAL SOC AMER
DOI: 10.1364/OE.16.014411
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资金
- University of Tennessee Space Institute
- DARPA [W911NF-07-1-0046]
- Division of Scientific User Facilities
- Office of Basic Energy Sciences
- U. S. Department of Energy
Use of high numerical aperture focusing with negative longitudinal spherical aberration is shown to enable deep (> 10 mu m), high aspect ratio, nano-scale-width holes to be machined into the surface of a fused-silica (SiO2) substrate with single pulses from a 200 fs, 4 mu J Ti-Sapphire laser source. The depths of the nano-holes are characterized by use of a non-destructive acetate replication technique and are confirmed by imaging of sectioned samples with a dual focused ion beam/scanning electron microscope.
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