期刊
OPTICAL MATERIALS
卷 32, 期 9, 页码 1146-1153出版社
ELSEVIER SCIENCE BV
DOI: 10.1016/j.optmat.2010.03.022
关键词
GLAD; Ellipsometry; Metallic thin films
Several chromium thin films with thicknesses comprised between 840 nm and 440 nm have been deposited by magnetron sputtering at glancing angle on silicon substrates. The deposition angle was varied between 0 degrees and 80 degrees resulting in nanosculpturecl thin films with column angles comprised between 0 degrees and 25 degrees. The surface topography of the films has been characterized by atomic force microscopy. It revealed different structurations of the surface originating from: the cross-section of the tilted columns with the surface, lateral ordering of the columns and faceting. The optical properties of the films have been determined from generalized ellipsometric measurements performed along different azimuths. The inspection of the off-diagonal elements of the Jones matrix as a function of columns tilt angle showed that both in-plane and out-of-plane anisotropy were present, associated with the columnar growth. (C) 2010 Elsevier B.V. All rights reserved.
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