期刊
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS
卷 267, 期 14, 页码 2376-2380出版社
ELSEVIER SCIENCE BV
DOI: 10.1016/j.nimb.2009.03.103
关键词
Proton beam writing; High aspect ratio; Electroplating; Au microstructure
类别
资金
- MOE Academic Research Fund [R-144-000-130-112]
- SSLS under NUS Core [C-380-003-003-001]
- A STAR/MOE [RP 3979908 M]
- A*STAR [12 105 0038]
We present an approach to fabricate tall high aspect ratio Au microstructures by means of proton beam direct writing. Combining proton beam direct writing and electroplating, we successfully produced gold structures with sub-micrometer lateral dimensions, structure heights in excess of 11 mu m, and aspect ratios over 28. Sidewall quality of the Au structures was improved by lowering the process temperature to 20 degrees C when developing PMMA patterns with GG developer. The application of such structures as X-ray masks for deep X-ray lithography with synchrotron radiation was demonstrated. (C) 2009 Elsevier B.V. All rights reserved.
作者
我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。
推荐
暂无数据