期刊
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS
卷 266, 期 14, 页码 3330-3331出版社
ELSEVIER SCIENCE BV
DOI: 10.1016/j.nimb.2008.03.229
关键词
high energy ion sputtering; ion etching; heavy ion beam lithography
Au ions (900 keV) have been used to directly sputter etch microstructures in silicon, aluminum, copper and silver. The results presented clearly demonstrate that high energy heavy ions can be used to fabricate microstructures in selected metals and silicon in a single step process. (C) 2008 Elsevier B.V. All rights reserved.
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