期刊
出版社
ELSEVIER SCIENCE BV
DOI: 10.1016/j.nimb.2008.02.017
关键词
ion beam sputtering; silver; surface plasmons
The growth of ultra-thin (10-17 nm) Ag films by ion beam sputtering with controlled morphology suitable for surface plasmon applications is demonstrated. A growth rate of 0.02 nm/s, by employing Ar ion energies as low as 150 eV, is achieved. These conditions result in a surface morphology that consists of oblate particles of size 10-30 nm, depending on the ion energy, with surface roughness of 1-3 nm. The aspect ratio of the grains decreases from 77 to 20 with increase in incident ion energy. The morphology-induced changes are manifested in the shift of the surface plasmon resonance peak from 440 to 480 nm. (c) 2008 Elsevier B.V. All rights reserved.
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