期刊
出版社
ELSEVIER
DOI: 10.1016/j.nima.2010.09.061
关键词
Etching; CZT; CdZnTe; AFM; Surface
类别
资金
- U.S. Department of Energy [DE-AC09-08SR22470]
- US DOE-National Nuclear Security Administration, through the Office of Nonproliferation and Verification Research and Development [DE-FG52-05NA27035]
A combination of atomic force microscopy, optical microscopy, and mass spectrometry was employed to study CdZnTe crystal surface and used etchant solution following exposure of the CdZnTe crystal to the Everson etch solution. We discuss the results of these studies in relationship to the initial surface preparation methods, the performance of the crystals as radiation spectrometers, the observed etch pit densities, and the chemical mechanism of surface etching. Our results show that the surface features that are exposed to etchants result from interactions with the chemical components of the etchants as well as pre-existing mechanical polishing. (C) 2010 Elsevier B.V. All rights reserved.
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