4.6 Article

The ageing effect in topological insulators: evolution of the surface electronic structure of Bi2Se3 upon K adsorption

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NEW JOURNAL OF PHYSICS
卷 15, 期 -, 页码 -

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IOP PUBLISHING LTD
DOI: 10.1088/1367-2630/15/11/113031

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资金

  1. National Science Foundation [DMR-0804665, DMR-1206354]
  2. SDSC Trestles [DMR060009N]
  3. Research Foundation Flanders (FWO)
  4. Division Of Materials Research
  5. Direct For Mathematical & Physical Scien [0804665, 1206354] Funding Source: National Science Foundation

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Topological insulators (TIs) have attracted a lot of interest in recent years due to their topologically protected surface states, as well as exotic proximity-induced phenomena and device applications for TI heterostructures. Since the first experimental studies of TIs, angle-resolved photoemission spectra (ARPES) showed that the electronic structure of the topological surface states significantly changes as a function of time after cleavage. The origin and underlying mechanism of this ageing effect are still under debate, despite its importance. Here we investigate the evolution of the surface Dirac cone for Bi2Se3 films upon asymmetric potassium (K) adsorption, using density-functional theory and a tight-binding model. We find that the K adatoms induce short-ranged downward band bending within 2-3 nm from the surface, due to charge transfer from the adatoms to the TI. These findings are in contrast to earlier proposals in the literature, that propose a long-ranged downward band bending up to 15 nm from the surface. Furthermore, as the charge transfer increases, we find that a new Dirac cone, localized slightly deeper into the TI than the original one, appears at the K-adsorbed surface, originating from strong Rashba-split conduction-band states. Our results suggest possible reinterpretations of experiments because the new Dirac cone might have been observed in ARPES measurements instead of the original one that appears immediately after cleavage. Our findings are consistent with ARPES data and provide insight into building TI-heterostructure devices by varying the band-bending potential or film thickness.

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