期刊
NATURE PROTOCOLS
卷 7, 期 2, 页码 311-327出版社
NATURE PUBLISHING GROUP
DOI: 10.1038/nprot.2012.003
关键词
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资金
- US Department of Energy
- Office of Basic Energy Sciences
- Division of Materials Science and Engineering [DE-SC0005247]
- US Army Research Office [W911NF-09-1-0476]
- US Air Force Office of Scientific Research [FA9550-09-1-0669-D0D35CAP]
- National Science Foundation (NSF) [ECS-0335765, DMR-1005022]
- Department of Defense
- Division Of Materials Research
- Direct For Mathematical & Physical Scien [1005022] Funding Source: National Science Foundation
We provide a protocol for transforming the structure of an array of high-aspect-ratio (HAR) micro/nanostructures into various new geometries. Polymeric HAR arrays are replicated from a Bosch-etched silicon master pattern by soft lithography. By using various conditions, the original pattern is coated with metal, which acts as an electrode for the electrodeposition of conductive polymers, transforming the original structure into a wide range of user-defined new designs. These include scaled replicas with sub-100-nm-level control of feature sizes and complex 3D shapes such as tapered or bent columnar structures bearing hierarchical features. Gradients of patterns and shapes on a single substrate can also be produced. This benchtop fabrication protocol allows the production of customized libraries of arrays of closed-cell or isolated HAR micro/nanostructures at a very low cost within 1 week, when starting from a silicon master that otherwise would be very expensive and slow to produce using conventional fabrication techniques.
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