4.6 Article

Schottky contact on ultra-thin silicon nanomembranes under light illumination

期刊

NANOTECHNOLOGY
卷 25, 期 48, 页码 -

出版社

IOP PUBLISHING LTD
DOI: 10.1088/0957-4484/25/48/485201

关键词

Si nanomembrane; ultra-thin nanomembrane; SOI; Schottky barriers; surface doping

资金

  1. National Natural Science Foundation of China [51322201, 51102049]
  2. Shanghai Municipal Education Commission
  3. Shanghai Education Development Foundation
  4. Specialized Research Fund for the Doctoral Program of Higher Education [20120071110025]
  5. Science and Technology Commission of Shanghai Municipality [12520706300, 14JC1400200]
  6. Visiting Scholar Foundation of National Key Laboratory of Fundamental Science of Micro/Nano-Devices and System Technology in Chongqing University [2014MS03]

向作者/读者索取更多资源

By repeating oxidation and subsequent wet chemical etching, we produced ultra-thin silicon nanomembranes down to 10 nm based on silicon-on-insulator structures in a controllable way. The electrical property of such silicon nanomembranes is highly influenced by their contacts with metal electrodes, in which Schottky barriers (SBs) can be tuned by light illumination due to the surface doping. Thermionic emission theory of carriers is applied to estimate the SB at the interface between metal electrodes and Si nanomembranes. Our work reveals that the Schottky contacts with Si nanomembranes can be influenced by external stimuli (like light luminescence or surface state) more heavily compared to those in the thicker ones, which implies that such ultra-thin-film devices could be of potential use in optical detectors.

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