Silicon nanocrystal production through non-thermal plasma synthesis: a comparative study between silicon tetrachloride and silane precursors

Silicon nanocrystals with sizes between 5 and 10 nm have been produced in a non-thermal plasma reactor using silicon tetrachloride as precursor. We demonstrate that high-quality material can be produced with this method and that production rates as high as 140 mg h(-1) can be obtained, with a maximum precursor utilization rate of roughly 50%. Compared to the case in which particles are produced using silane as the main precursor, the gas composition needs to be modified and hydrogen needs to be added to the mixture to enable the nucleation and growth of the powder. The presence of chlorine in the system leads to the production of nanoparticles with a chlorine terminated surface which is significantly less robust against oxidation in air compared to the case of a hydrogen terminated surface. We also observe that significantly higher power input is needed to guarantee the formation of crystalline particles, which is a consequence not only of the different gas-phase composition, but also of the influence of chlorine on the stability of the crystalline structure.