4.6 Article

Cell adhesion and migration on nanopatterned substrates and their effects on cell-capture yield

期刊

NANOTECHNOLOGY
卷 23, 期 39, 页码 -

出版社

IOP PUBLISHING LTD
DOI: 10.1088/0957-4484/23/39/395102

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资金

  1. Priority Research Centers Program
  2. Basic Science Research Program through the National Research Foundation of Korea (NRF)
  3. Ministry of Education, Science and Technology [2010-0029706, 2010-0019694]
  4. Human Resources Development Program of the Korea Institute of Energy Technology Evaluation and Planning (KETEP) [20104010100660]
  5. Korea Evaluation Institute of Industrial Technology (KEIT) [20124030200080] Funding Source: Korea Institute of Science & Technology Information (KISTI), National Science & Technology Information Service (NTIS)
  6. National Research Foundation of Korea [2010-0019694, 과C6B1912] Funding Source: Korea Institute of Science & Technology Information (KISTI), National Science & Technology Information Service (NTIS)

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With scanning electron microscopy analysis, we investigated the role of nanoscale topography on cellular activities; e.g. cell adhesion and spreading by culturing A549 cells (human lung carcinoma cell line cells) for 1-48 h on three sets of nanostructures; quartz nanopillars (QNPs), silicon nanopillars and silicon nanowire (SiNW) arrays, along with planar glass substrates. We found that cells on QNP arrays developed a longer shape than those on SiNW arrays. In addition, we studied how cell morphologies influence the cell-capture yield on the three sets of nanostructures. This research showed that the filopodial formations were directing the cell-capture yield on nanostructured substrates. This finding implies the possibility of using nanoscale topography features to control the filopodial formation including extension and migration from the cells. Using streptavidin-functionalized SiNW substrate, we further demonstrated a substantially higher yield (similar to 91.8 +/- 5.9%) than the planar glass wafers (similar to 24.1 +/- 7.5%) in the range of 200-3000 cells.

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