期刊
NANOTECHNOLOGY
卷 23, 期 8, 页码 -出版社
IOP PUBLISHING LTD
DOI: 10.1088/0957-4484/23/8/085302
关键词
-
资金
- DFG [Sonderforschungsbereich SFB 762]
This paper presents a method to obtain submicron- and nanometer structures of different oxide films and heterostructures combining e-beam lithography and chemical etching. The most relevant advantage of this method is that structures of tens of microns in length and below similar to 100 nm width can be produced, keeping the intrinsic bulk film properties, as proven by electrical transport measurements. In this way our method provides a bridge that connects the attractive properties of oxide films and the nanoworld.
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