Auxiliary drying to prevent pattern collapse in high aspect ratio nanostructures

Many defects are generated in densely packed high aspect ratio structures during nanofabrication. Pattern collapse is one of the serious problems that may arise, mainly due to the capillary force during drying after the rinsing process. In this paper, a method of auxiliary drying is presented to prevent pattern collapse in high aspect ratio nanostructures by adding an auxiliary substrate as a reinforcing rib to restrict deformation and to balance the capillary force. The principle of the method is presented based on the analysis of pattern collapse. A finite element method is then applied to analyze the deformation of the resist beams caused by the surface tension using the ANSYS software, and the effect of the nanostructure's length to width ratio simulated and analyzed. Finally, the possible range of applications based on the proposed method is discussed. Our results show that the aspect ratio may be increased 2.6 times without pattern collapse; furthermore, this method can be widely used in the removal of solvents in micro-and nanofabrication.