期刊
NANOTECHNOLOGY
卷 19, 期 42, 页码 -出版社
IOP PUBLISHING LTD
DOI: 10.1088/0957-4484/19/42/424016
关键词
-
资金
- EU Integrated Project NAIMO [NMP4-CT-2004-500355]
Nanoimprint lithography is used to directly pattern the conjugated polymer semiconductor poly(3-hexylthiophene) (P3HT). We obtain trenches with aspect ratios up to 2 and feature sizes as small as 50 nm in this polymer. The application to organic solar cells is shown by creating an interpenetrated donor-acceptor interface, based on P3HT and N,N'-ditridecyl-3,4,9,10-perylenetetracarboxylic diimide (PTCDI-C-13), deposited from the vapor phase to reduce shadow effects. A planarizing layer of spin-coated zinc oxide (ZnO) nanoparticles is used to reduce the roughness of the layer stack. The response of the photovoltaic devices follows the increased interface area, up to a 2.5-fold enhancement.
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