相关参考文献
注意：仅列出部分参考文献，下载原文获取全部文献信息。Passive and heterogeneous integration towards a Si-based System-in-Package concept
F Roozeboom et al.
THIN SOLID FILMS (2006)
Deep reactive ion etching and focused ion beam combination for nanotip fabrication
G Villanueva et al.
MATERIALS SCIENCE & ENGINEERING C-BIOMIMETIC AND SUPRAMOLECULAR SYSTEMS (2006)
New route to three-dimensional photonic bandgap materials:: Silicon double inversion of polymer templates
N Tétreault et al.
ADVANCED MATERIALS (2006)
Effects of disorder on propagation losses and cavity Q-factors in photonic crystal slabs
D Gerace et al.
PHOTONICS AND NANOSTRUCTURES-FUNDAMENTALS AND APPLICATIONS (2005)
Maximum achievable aspect ratio in deep reactive ion etching of silicon due to aspect ratio dependent transport and the microloading effect
J Yeom et al.
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B (2005)
Characterization of buried photonic crystal waveguides and microcavities fabricated by deep ultraviolet lithography -: art. no. 013103
I Märki et al.
JOURNAL OF APPLIED PHYSICS (2005)
Advanced etching of silicon based on deep reactive ion etching for silicon high aspect ratio microstructures and three-dimensional micro- and nanostructures
F Marty et al.
MICROELECTRONICS JOURNAL (2005)
Origin, control and elimination of undercut in silicon deep plasma etching in the cryogenic process
M Boufnichel et al.
MICROELECTRONIC ENGINEERING (2005)
Nanophotonic waveguides in silicon-on-insulator fabricated with CMOS technology
W Bogaerts et al.
JOURNAL OF LIGHTWAVE TECHNOLOGY (2005)
Large-area three-dimensional structuring by electrochemical etching and lithography
S Matthias et al.
ADVANCED MATERIALS (2004)
Single-mask, three-dimensional microfabrication of high-aspect-ratio structures in bulk silicon using reactive ion etching lag and sacrificial oxidation
MP Rao et al.
APPLIED PHYSICS LETTERS (2004)
Fabrication of two-dimensional infrared photonic crystals by deep reactive ion etching on Si wafers and their optical properties
M Zhou et al.
SOLID STATE COMMUNICATIONS (2004)
Critical tasks in high aspect ratio silicon dry etching for microelectromechanical systems
IW Rangelow
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A (2003)
Scattering at sidewall roughness in photonic crystal slabs
W Bogaerts et al.
OPTICS LETTERS (2003)
Tunable inverse opal hydrogel pH sensors
YJ Lee et al.
ADVANCED MATERIALS (2003)
Radiation losses in planar photonic crystals:: two-dimensional representation of hole depth and shape by an imaginary dielectric constant
R Ferrini et al.
JOURNAL OF THE OPTICAL SOCIETY OF AMERICA B-OPTICAL PHYSICS (2003)
Guidelines for etching silicon MEMS structures using fluorine high-density plasmas at cryogenic temperatures
MJ de Boer et al.
JOURNAL OF MICROELECTROMECHANICAL SYSTEMS (2002)
Fabrication of 2-D and 3-D silicon photonic crystals by deep etching
A Chelnokov et al.
IEEE JOURNAL OF SELECTED TOPICS IN QUANTUM ELECTRONICS (2002)
Depth and profile control in plasma etched MEMS structures
J Kiihamäki et al.
SENSORS AND ACTUATORS A-PHYSICAL (2000)
分享论文
