期刊
NANOSCALE RESEARCH LETTERS
卷 5, 期 10, 页码 1570-1577出版社
SPRINGER
DOI: 10.1007/s11671-010-9678-y
关键词
Antireflective; Nanosilver; Nanostructure; Nanoislands; Colloidal lithography
资金
- Center for Nanoscale Mechatronics and Manufacturing [08K1401-00511]
- Ministry of the Knowledge Economy of Korea [10033636-2009-11]
- Korea Evaluation Institute of Industrial Technology (KEIT) [10033636] Funding Source: Korea Institute of Science & Technology Information (KISTI), National Science & Technology Information Service (NTIS)
- National Research Foundation of Korea [14-2008-04-001-00] Funding Source: Korea Institute of Science & Technology Information (KISTI), National Science & Technology Information Service (NTIS)
An alternative method is presented for fabricating an antireflective nanostructure array using nanosilver colloidal lithography. Spin coating was used to produce the multilayered silver nanoparticles, which grew by self-assembly and were transformed into randomly distributed nanosilver islands through the thermodynamic action of dewetting and Oswald ripening. The average size and coverage rate of the islands increased with concentration in the range of 50-90 nm and 40-65%, respectively. The nanosilver islands were critically affected by concentration and spin speed. The effects of these two parameters were investigated, after etching and wet removal of nanosilver residues. The reflection nearly disappeared in the ultraviolet wavelength range and was 17% of the reflection of a bare silicon wafer in the visible range.
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