期刊
NANOSCALE
卷 6, 期 21, 页码 12391-12396出版社
ROYAL SOC CHEMISTRY
DOI: 10.1039/c4nr04315d
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资金
- FWO (Flanders)
- Methusalem - Flemish Government
The 193 nm deep UV immersion lithography is leveraged to fabricate highly dense and uniform arrays of Au-capped Si nanopillars on a 300 mm wafer level, and the substrates are applied in surface enhanced Raman spectroscopy for reliable molecule detection. Due to the sub-10 nm gap sizes and ultra-high array density with the lattice constant less than 100 nm, our nanopillar based substrates outperform the current commercial products in terms of the signal intensity, reproducibility and fabrication scale.
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