4.8 Article

High-yield fabrication of nm-size gaps in monolayer CVD graphene

期刊

NANOSCALE
卷 6, 期 13, 页码 7249-7254

出版社

ROYAL SOC CHEMISTRY
DOI: 10.1039/c4nr01838a

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资金

  1. Swiss Nanoscience Institute (SNI)
  2. Swiss NSF [126969]
  3. OTKA [K105735]
  4. European Commission (EC) [263091]
  5. EC FP7-ICT SYMONE [105244]
  6. EC FP7-ITN MOLESCO [606728]
  7. SCIEX fellowship

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Herein we demonstrate the controlled and reproducible fabrication of sub-5 nm wide gaps in single-layer graphene electrodes. The process is implemented for graphene grown via chemical vapor deposition using an electroburning process at room temperature and in vacuum. A yield of over 95% for the gap formation is obtained. This approach allows producing single-layer graphene electrodes for molecular electronics at a large scale. Additionally, from Raman spectroscopy and electroburning carried out simultaneously, we can follow the heating process and infer the temperature at which the gap formation happens.

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