期刊
NANOSCALE
卷 3, 期 8, 页码 3089-3093出版社
ROYAL SOC CHEMISTRY
DOI: 10.1039/c1nr10504c
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资金
- MEST [2010-0008208, 2010-0029649, 2010-0029711, 2010-00285]
- KOSEF through EPB center [2010001779]
- World Class University (WCU) [R31-2008-000-10059-0]
A direct and metal layer-free growth of flat graphene pads on exfoliated hexagonal boron nitride substrate (h-BN) are demonstrated by atmospheric chemical vapour deposition (CVD) process. Round shape with high flatness graphene pads are grown in high yield (similar to 95%) with a pad thickness of similar to 0.5 nm and homogenous diameter.
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