4.8 Article

Robust reduction of graphene fluoride using an electrostatically biased scanning probe

期刊

NANO RESEARCH
卷 6, 期 11, 页码 767-774

出版社

TSINGHUA UNIV PRESS
DOI: 10.1007/s12274-013-0355-1

关键词

graphene fluoride; graphene; electrostatic lithography; Kelvin force probe microscopy; atomic force microscopy-based electrostatic nanolithography (AFMEN)

资金

  1. Office of Naval Research
  2. NRL Nanoscience Institute

向作者/读者索取更多资源

We report a novel and easily accessible method to chemically reduce graphene fluoride (GF) sheets with nanoscopic precision using high electrostatic fields generated between an atomic force microscope (AFM) tip and the GF substrate. Reduction of fluorine by the electric field produces graphene nanoribbons (GNR) with a width of 105-1,800 nm with sheet resistivity drastically decreased from > 1 T Omega center dot sq.(-1) (GF) down to 46 k Omega center dot sq.(-1) (GNR). Fluorine reduction also changes the topography, friction, and work function of the GF. Kelvin probe force microscopy measurements indicate that the work function of GF is 180-280 meV greater than that of graphene. The reduction process was optimized by varying the AFM probe velocity between 1.2 mu m center dot s(-1) and 12 mu m center dot s(-1) and the bias voltage applied to the sample between -8 and -12 V. The electrostatic field required to remove fluorine from carbon is similar to 1.6 V center dot nm(-1). Reduction of the fluorine may be due to the softening of the C-F bond in this intense field or to the accumulation and hydrolysis of adventitious water into a meniscus.

作者

我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。

评论

主要评分

4.8
评分不足

次要评分

新颖性
-
重要性
-
科学严谨性
-
评价这篇论文

推荐

暂无数据
暂无数据