4.8 Article

Scanning tunneling microscope observations of non-AB stacking of graphene on Ni films

期刊

NANO RESEARCH
卷 4, 期 7, 页码 712-721

出版社

TSINGHUA UNIV PRESS
DOI: 10.1007/s12274-011-0127-8

关键词

Graphene; scanning tunneling microscopy (STM); segregation; Moire pattern; growth

资金

  1. National Natural Science Foundation of China [20973013, 51072004, 50821061, 20833001, 21073003, 20973006, 50802003]
  2. Ministry of Science and Technology of China [2007CB936203, 2011CB921903, 2009CB929403]
  3. Doctoral Foundation of Henan Polytechnic University [B2009-90]

向作者/读者索取更多资源

Microscopic features of graphene segregated on Ni films prior to chemical transfer-including atomic structures of monolayers and bilayers, Moir, patterns due to non-AB stacking, as well as wrinkles and ripples caused by strain effects-have been characterized in detail by high-resolution scanning tunneling microscopy (STM). We found that the stacking geometry of the bilayer graphene usually deviates from the traditional Bernal stacking (or so-called AB stacking), resulting in the formation of a variety of Moir, patterns. The relative rotations inside the bilayer were then qualitatively deduced from the relationship between Moir, patterns and carbon lattices. Moreover, we found that typical defects such as wrinkles and ripples tend to evolve around multi-step boundaries of Ni, thus reflecting strong perturbations from substrate corrugations. These investigations of the morphology and the mechanism of formation of wrinkles and ripples are fundamental topics in graphene research. This work is expected to contribute to the exploration of electronic and transport properties of wrinkles and ripples.

作者

我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。

评论

主要评分

4.8
评分不足

次要评分

新颖性
-
重要性
-
科学严谨性
-
评价这篇论文

推荐

暂无数据
暂无数据