期刊
NANO RESEARCH
卷 3, 期 12, 页码 874-880出版社
TSINGHUA UNIV PRESS
DOI: 10.1007/s12274-010-0060-2
关键词
Topological insulator; electronic structure; scanning tunneling microscopy; angle-resolved photoemission spectroscopy; molecular beam epitaxy
类别
资金
- National Natural Science Foundation of China (NSFC)
- Ministry of Science and Technology of China (MOST)
- National Science Foundation (NSF) [DMR 0908700]
The growth and characterization of single-crystalline thin films of topological insulators (TIs) is an important step towards their possible applications. Using in situ scanning tunneling microscopy (STM) and angle-resolved photoemission spectroscopy (ARPES), we show that moderately thick Sb2Te3 films grown layer-by-layer by molecular beam epitaxy (MBE) on Si(111) are atomically smooth, single-crystalline, and intrinsically insulating. Furthermore, these films were found to exhibit a robust TI electronic structure with their Fermi energy lying within the energy gap of the bulk that intersects only the Dirac cone of the surface states. Depositing Cs in situ moves the Fermi energy of the Sb2Te3 films without changing the electronic band structure, as predicted by theory. We found that the TI behavior is preserved in Sb2Te3 films down to five quintuple layers (QLs).
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