4.8 Article

Tuning the Dirac Point in CVD-Grown Graphene through Solution Processed n-Type Doping with 2-(2-Methoxyphenyl)-1,3-dimethyl-2,3-dihydro-1H-benzoimidazole

期刊

NANO LETTERS
卷 13, 期 5, 页码 1890-1897

出版社

AMER CHEMICAL SOC
DOI: 10.1021/nl303410g

关键词

CVD grown graphene; n-type doping; Dirac point; solution-process; transistor; inkjet-printing

资金

  1. AFOSR [FA9950-09-1-0256]
  2. National Science Foundation Materials Network Program (NSF) [DMR-1209468]
  3. Global Climate and Energy Project (GCEP)
  4. Direct For Mathematical & Physical Scien
  5. Division Of Materials Research [1209468] Funding Source: National Science Foundation

向作者/读者索取更多资源

Controlling the Dirac point of graphene is essential for complementary circuits. Here, we describe the use of 2-(2-methoxyphenyl)-1,3-dimethy1-2,3-dihydro-1H-benzoimidazole (o-MeO-DMBI) as a strong n-type dopant for chemical-vapor-deposition (CVD) grown graphene. The Dirac point of graphene can be tuned significantly by spin-coating o-MeO-DMBI solutions on the graphene sheets at different concentrations. The transport of graphene can be changed from p-type to ambipolar and finally n-type. The electron transfer between o-MeO-DMBI and graphene was additionally confirmed by Raman imaging and photoemission spectroscopy (PES) measurements. Finally, we fabricated complementary inverter via inkjet printing patterning of o-MeO-DMBI solutions on graphene to demonstrate the potential of o-MeO-DMBI n-type doping on graphene for future applications in electrical devices.

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