4.8 Article

Patterned Defect Structures Predicted for Graphene Are Observed on Single-Layer Silica Films

期刊

NANO LETTERS
卷 13, 期 9, 页码 4422-4427

出版社

AMER CHEMICAL SOC
DOI: 10.1021/nl402264k

关键词

Ultrathin oxide films; silica; silicatene; topological defects; graphene

资金

  1. Fonds der Chemischen Industrie
  2. Deutsche Forschungsgemeinschaft through CoE UniCat
  3. Alexander von Humboldt Foundation

向作者/读者索取更多资源

Topological defects in two-dimensional materials such as graphene are considered as a tool for tailoring their physical properties. Here, we studied defect structures on a single-layer silica (silicatene) supported on Ru(0001) using a low energy electron diffraction, scanning tunneling microscopy, infrared reflection absorption spectroscopy, and photoelectron spectroscopy. The results revealed easy formation of periodic defect structures, which were previously predicted for graphene on a theoretical ground, yet experimentally unrealized. The structural similarities between single-layer materials (graphene, silicene, silicatene) open a new playground for deeper understanding and tailoring structural, electronic, and chemical properties of the truly two-dimensional systems.

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