期刊
NANO LETTERS
卷 13, 期 3, 页码 873-883出版社
AMER CHEMICAL SOC
DOI: 10.1021/nl3033075
关键词
Nanowires; vapor-liquid-solid; nucleation; incubation time; pulsed deposition; chemical vapor deposition; non-steady state; numerical simulation
类别
资金
- European commission [246331, 257856, 227497]
Today, the vapor liquid solid (VLS) growth mechanism is a common process for the metal catalyzed bottom-up growth of semiconductor nanowires (NWs). Nevertheless, most of the literature only is concerned with the steady-state NW growth which applies when the amount of material supplied is equal to the amount consumed by the NW growth at the same time. While this description is suitable for chemical vapor deposition (CVD) or electron beam evaporation (EBE) processes after the initial nucleation time, problems arise when pulsed growth processes like pulsed laser deposition (PLD) are used since in this case the steady state growth condition cannot be applied. Moreover, the initial phase of NW growth cannot be described with steady state growth conditions, either. In this work, we present a modeling approach for VLS NW growth based on numerical simulations, which is capable of describing the nucleation phase of the VLS growth process as well as a pulsed deposition process.
作者
我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。
推荐
暂无数据