期刊
NANO LETTERS
卷 12, 期 3, 页码 1549-1554出版社
AMER CHEMICAL SOC
DOI: 10.1021/nl2044088
关键词
Superlens; surface plasmons; nanophotolithography; subdiffraction-limit; surface roughness; aspect ratio
类别
资金
- Agency for Science, Technology and Research (A*STAR) [0921540099, 0921450030]
- U.K. Physical Sciences and Engineering Research Council (EPSRC)
- Leverhulme Trust
- EPSRC [EP/H000917/2, EP/D063329/1] Funding Source: UKRI
- Engineering and Physical Sciences Research Council [EP/D063329/1, EP/H000917/2] Funding Source: researchfish
Photolithography is the technology of choice for mass patterning in semiconductor and data storage industries. Super lenses have demonstrated the capability of subdiffraction-limit imaging and been envisioned as a promising technology for potential nanophotolithography. Unfortunately, subdiffraction-limit patterns generated by current superlenses exhibited poor profile depth far below the requirement for photolithography. Here, we report an experimental demonstration of sub-50 nm resolution nanophotolithography via a smooth silver superlens with a high aspect profile of similar to 45 nm, as well as grayscale subdiffraction-limit three-dimensional nanopatterning. Theoretical analysis and simulation show that smooth interfaces play a critical role. Super lens-based lithography can be integrated with conventional UV photolithography systems to endow them with the capability of nanophotolithography, which could provide a cost-effective approach for large scale and rapid nanopatterning.
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