4.8 Article

Ultraclean Emission from InAsP Quantum Dots in Defect-Free Wurtzite InP Nanowires

期刊

NANO LETTERS
卷 12, 期 11, 页码 5919-5923

出版社

AMER CHEMICAL SOC
DOI: 10.1021/nl303327h

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Nanowire; Qauntum dot; InAs/InP; Single photon source; Chemical beam epitaxy; Selective-area VLS growth

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We report on the ultraclean emission from single quantum dots embedded in pure wurtzite nanowires. Using a two-step growth process combining selective-area and vapor-liquid-solid epitaxy, we grow defect-free wurtzite InP nanowires with embedded InAsP quantum dots, which are clad to diameters sufficient for waveguiding at lambda similar to 950 nm. The absence of nearby traps, at both the nanowire surface and along its length in the vicinity of the quantum dot, manifests in excitonic transitions of high spectral purity. Narrow emission line widths (30 mu eV) and very-pure single photon emission with a probability of multiphoton emission below 1% are achieved, both of which were not possible in previous work where stacking fault densities were significantly higher.

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