High-Rotational Symmetry Lattices Fabricated by Moire Nanolithography

This paper describes a new nanofabrication method, moire nanolithography, that can fabricate subwavelength lattices with high-rotational symmetries. By exposing elastomeric photomasks sequentially at multiple offset angles, we created arrays with rotational symmetries as high as 36-fold, which is three times higher than quasiperiodic lattices (<= 12-fold) and six times higher than two-dimensional periodic lattices (<= 6-fold). Because these moire nanopatterns can be generated over wafer-scale areas, they are promising for a range of photonic applications, especially those that require broadband, omnidirectional absorption of visible light.