期刊
NANO LETTERS
卷 10, 期 9, 页码 3722-3726出版社
AMER CHEMICAL SOC
DOI: 10.1021/nl1023518
关键词
Block copolymer lithography; metallic nanowires; magnetic nanowires; metal gratings; polystyrene-polydimethylsiloxane
类别
资金
- Semiconductor Research Corporation
- Office of Naval Research
- National Research Foundation [KRF-2008-314-D00153]
- BK21 program
- National Research Foundation of Korea [2008-314-D00153, 314-2008-1-D00153] Funding Source: Korea Institute of Science & Technology Information (KISTI), National Science & Technology Information Service (NTIS)
Metallic nanowires are useful for fabricating highly integrated nanoscale electrical magnetic, and photonic devices. However, conventional methods based on bottom up growth techniques are subject to concerns such as broad distributions in their dimension as well and difficulties in precise placement of the nanowires. These issues can be solved by the guided self assembly of block copolymer thin films that can produce periodic arrays of monodisperse nanoscale features With excellent positional accuracy. Here, we report transfer of high-quality linear block copolymer patterns into various metals, Ti, W, Pt, Co, Ni, Ta, Au, and Al, to fabricate highly ordered nanowire arrays with widths down to 9 nm. This novel patterning process does not require specific film deposition techniques or etch-chemistries. We also describe their structural, magnetic; and electrical properties.
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