期刊
NANO LETTERS
卷 10, 期 11, 页码 4399-4404出版社
AMER CHEMICAL SOC
DOI: 10.1021/nl101942s
关键词
Dip-pen; lithography; poly(ethylene glycol); photomask; photoresist; phase-shift; nano; lens; finite element method; simulation
类别
资金
- National Science Foundation [CHE-0843832]
- Northwestern NSEC Center (NSF) [EEC-0647560]
- AFOSR
- DARPA
Poly(ethylene glycol) (PEG) polymer lens arrays are made by using dip-pen nanolithography to deposit nanoscale PEG features on hydrophobically modified quartz glass. The dimensions of the PEG lenses are controlled by tuning dwell time and polymer molecular weight. The PEG polymer lenses on the quartz substrate act as a phase-shift photomask for fabricating subwavelength scale features, similar to 100 nm in width. Depending upon UV irradiation time during the photolithography, the photoresist nanostructures can be transitioned from well-shaped (short time) to ring-shaped (long time) features. The technique can be used to pattern large areas through the use of cantilever arrays.
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