4.8 Article

Tunneling Electroresistance Effect in Ferroelectric Tunnel Junctions at the Nanoscale

期刊

NANO LETTERS
卷 9, 期 10, 页码 3539-3543

出版社

AMER CHEMICAL SOC
DOI: 10.1021/nl901754t

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资金

  1. National Science Foundation [MRSEC DMR-0820521]
  2. Semiconductor Research Corporation [NRI ECCS-0708759, 2009-RJ-2017G]
  3. Office of Naval Research [N00014-07-1-0215]

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Using a set of scanning probe microscopy techniques, we demonstrate the reproducible tunneling electroresistance effect on nanometer-tick epitaxial BaTiO3 single-crystalline thin films on SrRuO3 bottom electrodes. Correlation between ferroelectric and electronic transport properties is established by direct nanoscale visualization and control of polarization and tunneling current. The obtained results show a change in resistance by about 2 orders of magnitude upon polarization reversal on a lateral scale of 20 nm at room temperature. These results are promising for employing ferroelectric tunnel Junctions In nonvolatile memory and logic devices.

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