期刊
NANO LETTERS
卷 9, 期 1, 页码 467-472出版社
AMER CHEMICAL SOC
DOI: 10.1021/nl803512z
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资金
- U.S. Department of Energy [DE-AC0205CH11231]
- Directorate For Engineering [0826131] Funding Source: National Science Foundation
We present a novel fabrication method for incorporating nanometer to micrometer scale few-layer graphene (FLG) features onto substrates with electrostatic exfoliation. We pattern highly oriented pyrolytic graphite using standard lithographic techniques and subsequently, in a single step, exfoliate and transfer-print the prepatterned FLG features onto a silicon wafer using electrostatic force. We have successfully demonstrated the exfoliation/printing of 18 nm wide FLG nanolines and periodic arrays of 1.4 mu m diameter pillars. Furthermore, we have fabricated graphene nanoribbon transistors using the patterned graphene nanoline. Our electrostatic force assisted exfoliation/print process does not need additional adhesion layers and could be stepped and repeated to deliver the prepatterned graphitic material over wafer-sized areas and allows the construction of graphene-based integrated circuits.
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