期刊
NANO LETTERS
卷 8, 期 7, 页码 1986-1990出版社
AMER CHEMICAL SOC
DOI: 10.1021/nl801030c
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-
类别
资金
- Division Of Materials Research
- Direct For Mathematical & Physical Scien [819860] Funding Source: National Science Foundation
We report a new approach to adjust and improve nanostructures after their initial fabrication, which can reduce the trench width and hole diameter to sub-10 nm, while smoothing edge roughness and perfecting pattern shapes. In this method, termed pressed self-perfection by liquefaction (P-SPEL), a flat guiding plate is pressed on top of the structures (which are soften or molten transiently) on a substrate to reduce their height and guide the flow of the materials into the desired geometry before hardening. P-SPEL results in smaller spacing between two structures or smaller holes in a thin film.
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