4.5 Article

Chemical doping of MoS2 multilayer by p-toluene sulfonic acid

期刊

出版社

TAYLOR & FRANCIS LTD
DOI: 10.1088/1468-6996/16/3/035009

关键词

molybdenum disulfide; field-effect transistor; p-toluene sulfonic acid; doping

资金

  1. National Research Foundation of Korea (NRF) - Ministry of Science, ICT and Future Planning [2012M3A7B4049888]
  2. Priority Research Center Program through NRF - Ministry of Education [2010-0020207]
  3. Basic Science Research Program through NRF - Ministry of Education [2013R1A1A2061396]
  4. National Research Foundation of Korea [2012M3A7B4049888, 2010-0020207, 2013R1A1A2061396] Funding Source: Korea Institute of Science & Technology Information (KISTI), National Science & Technology Information Service (NTIS)

向作者/读者索取更多资源

We report the tailoring of the electrical properties of mechanically exfoliated multilayer (ML) molybdenum disulfide (MoS2) by chemical doping. Electrical charge transport and Raman spectroscopy measurements revealed that the p-toluene sulfonic acid (PTSA) imposes n-doping in ML MoS2. The shift of threshold voltage for ML MoS2 transistor was analyzed as a function of reaction time. The threshold voltage shifted toward more negative gate voltages with increasing reaction time, which indicates an n-type doping effect. The shift of the Raman peak positions was also analyzed as a function of reaction time. PTSA treatment improved the field-effect mobility by a factor of similar to 4 without degrading the electrical characteristics of MoS2 devices.

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