4.5 Article

Atomic Resolution Phase Contrast Imaging and In-Line Holography Using Variable Voltage and Dose Rate

期刊

MICROSCOPY AND MICROANALYSIS
卷 18, 期 5, 页码 982-994

出版社

CAMBRIDGE UNIV PRESS
DOI: 10.1017/S1431927612001213

关键词

in-line electron holography; aberration-corrected TEM; high-resolution TEM; low voltage TEM; low dose TEM; monochromator; exit wave reconstruction; focal series; lattice phonons

资金

  1. U.S. Department of Energy [DE-AC02-05CH11231]
  2. Office of Science, Office of Basic Energy Sciences, Scientific User Facilities Division, of the U.S. Department of Energy [DE-AC02-05CH11231]
  3. IPN (SIP, COFAA)
  4. CONACYPT [129207]

向作者/读者索取更多资源

The TEAM 0.5 electron microscope is employed to demonstrate atomic resolution phase contrast imaging and focal series reconstruction with acceleration voltages between 20 and 300 kV and a variable dose rate. A monochromator with an energy spread of <= 0.1 eV is used for dose variation by a factor of 1,000 and to provide a beam-limiting aperture. The sub-Angstrom performance of the instrument remains uncompromised. Using samples obtained from silicon wafers by chemical etching, the [200] atom dumbbell distance of 1.36 angstrom can be resolved in single images and reconstructed exit wave functions at 300, 80, and 50 kV. At 20 kV, atomic resolution < 2 angstrom is readily available but limited by residual lens aberrations at large scattering angles. Exit wave functions reconstructed from images recorded under low dose rate conditions show sharper atom peaks as compared to high dose rate. The observed dose rate dependence of the signal is explained by a reduction of beam-induced atom displacements. If a combined sample and instrument instability is considered, the experimental image contrast can be matched quantitatively to simulations. The described development allows for atomic resolution transmission electron microscopy of interfaces between soft and hard materials over a wide range of voltages and electron doses.

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