4.4 Article

Injection moulding antireflective nanostructures

期刊

MICROELECTRONIC ENGINEERING
卷 121, 期 -, 页码 47-50

出版社

ELSEVIER SCIENCE BV
DOI: 10.1016/j.mee.2014.03.027

关键词

Antireflection; Black silicon; Nanofabrication; Large area; Injection moulding; Large volume production

资金

  1. NanoPlast project - Danish National Advanced Technology Foundation [007-2010-2]
  2. European Commission [NMP2-SE-2012-314345]

向作者/读者索取更多资源

We present a method for injection moulding antireflective nanostructures on large areas, for high volume production. Nanostructured black silicon masters were fabricated by mask-less reactive ion etching, and electroplated with nickel. The nickel shim was antistiction coated and used in an injection moulding process, to fabricate the antireflective surfaces. The cycle-time was 35 s. The injection moulded structures had a height of 125 nm, and the visible spectrum reflectance of injection moulded black polypropylene surfaces was reduced from 4.5 +/- 0.5% to 2.5 +/- 0.5%. The gradient of the refractive index of the nanostructured surfaces was estimated from atomic force micrographs and the theoretical reflectance was calculated using the transfer matrix method and effective medium theory. The measured reflectance shows good agreement with the theory of graded index antireflective nanostructures. (C) 2014 Elsevier B.V. All rights reserved.

作者

我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。

评论

主要评分

4.4
评分不足

次要评分

新颖性
-
重要性
-
科学严谨性
-
评价这篇论文

推荐

暂无数据
暂无数据