4.4 Article Proceedings Paper

Resistive switching characteristics of CMOS embedded HfO2-based 1T1R cells

期刊

MICROELECTRONIC ENGINEERING
卷 88, 期 7, 页码 1133-1135

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ELSEVIER
DOI: 10.1016/j.mee.2011.03.123

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Resistive switching; HfO2; 1T1R

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This work addresses a 1T1R RRAM architecture, which allows for the precise and reliable control of the forming/set current by using an access transistor. The 1T1R devices were fabricated in a modified 0.25 mu m CMOS technology. The memory cells show stable resistive switching in dc as well as pulse-induced mode with an endurance of 10(3) and 10(2) cycles, respectively. The variation of pulse widths as a function of amplitudes in 1R devices confirmed the set process distribution over a wide range of pulse widths (300 ns-100 mu A), whereas the reset process variation is confined (1-3 mu s). (c) 2011 Elsevier B.V. All rights reserved.

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