期刊
MICROELECTRONIC ENGINEERING
卷 88, 期 8, 页码 2736-2739出版社
ELSEVIER SCIENCE BV
DOI: 10.1016/j.mee.2010.12.046
关键词
Electron-beam lithography; Multilevel; Reflow; Molecular weight; Microprism; Blazed grating; Stamps; Nanoimprint lithography
资金
- EC [NMP 214249]
A novel process route is presented for the fabrication of three-dimensional (3D) patterns with both vertical and inclined profiles in close vicinity on the same substrate. The 3D patterns were generated by dose-modulated electron-beam lithography (EBL) in polymeric resist combined with a thermal annealing (reflow) post-treatment at a moderate temperature. Thus, technical limitations usually connected with grayscale EBL to manufacture continuous patterns were overcome. 3D sawtooth structures which exhibit both sharp and continuous profiles were generated and slopes up to 270 with smooth surfaces were achieved. (C) 2010 Elsevier B.V. All rights reserved.
作者
我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。
推荐
暂无数据