4.4 Article

Fabrication of 3D patterns with vertical and sloped sidewalls by grayscale electron-beam lithography and thermal annealing

期刊

MICROELECTRONIC ENGINEERING
卷 88, 期 8, 页码 2736-2739

出版社

ELSEVIER SCIENCE BV
DOI: 10.1016/j.mee.2010.12.046

关键词

Electron-beam lithography; Multilevel; Reflow; Molecular weight; Microprism; Blazed grating; Stamps; Nanoimprint lithography

资金

  1. EC [NMP 214249]

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A novel process route is presented for the fabrication of three-dimensional (3D) patterns with both vertical and inclined profiles in close vicinity on the same substrate. The 3D patterns were generated by dose-modulated electron-beam lithography (EBL) in polymeric resist combined with a thermal annealing (reflow) post-treatment at a moderate temperature. Thus, technical limitations usually connected with grayscale EBL to manufacture continuous patterns were overcome. 3D sawtooth structures which exhibit both sharp and continuous profiles were generated and slopes up to 270 with smooth surfaces were achieved. (C) 2010 Elsevier B.V. All rights reserved.

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