Ultradense silicon nanowire arrays produced via top-down planar technology

A process is developed for the fabrication of vertically arranged poly-silicon nanowires via a rigorously top-down batch process. The technique allows the production of wire arrays with larger linear density (projected on the surface) than those achievable with any of the other proposed top-down processes. (c) 2010 Elsevier B.V. All rights reserved.