Laser interference lithography for nanoscale structuring of materials: From laboratory to industry

Periodic structures are of increasing interest in many fields such as nanotechnology and biotechnology among others. Laser interference Lithography (LIL) has been widely studied for the fabrication of periodic structures. However, a LIL tool for the nanoscale structuring of materials that can scale beyond laboratory prototypes into cost affective industrial processes is not yet defined. In this work, we describe a versatile and automatic high-power multiple beam interference lithography system design capable of overcoming the limitations of manual setups. Using this system, we have successfully processed photoresist samples on the whole surface of 3 in. silicon wafers, demonstrating the applicability of this prototype to a wide range of device fabrication. (C) 2008 Elsevier B.V. All rights reserved.